Textured growth of metallic fcc nanowires under direct and alternating current deposition conditions

For the fabrication of metallic nanowires, nanoporous templates are produced by irradiating polymeric foils at the UNILAC facility. After chemical etching of the ioninduced damage tracks, the cylindrical pores of the template are filled with metals by electrodeposition. The resulting nanowires have high aspect ratios (diameter a few ten nm, length a few ten μm). Here, we investigate the textured growth of metallic face-centered cubic (fcc) nanowires, in particular Cu [1] and Au [2]. Under direct current (dc) growth conditions, 〈110〉 textured wire ensembles occur, whereas 〈100〉 growth directions develop under alternating current (ac) deposition. X-ray diffractograms of Au nanowire ensembles of different textures are shown in figure 1.